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GLCM-based chi-square histogram distance for automatic detection of defects on patterned textures

机译:基于GLCm的卡方直方图距离自动检测   图案纹理上的缺陷

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摘要

Chi-square histogram distance is one of the distance measures that can beused to find dissimilarity between two histograms. Motivated by the fact thattexture discrimination by human vision system is based on second-orderstatistics, we make use of histogram of gray-level co-occurrence matrix (GLCM)that is based on second-order statistics and propose a new machine visionalgorithm for automatic defect detection on patterned textures. Input defectiveimages are split into several periodic blocks and GLCMs are computed afterquantizing the gray levels from 0-255 to 0-63 to keep the size of GLCM compactand to reduce computation time. Dissimilarity matrix derived from chi-squaredistances of the GLCMs is subjected to hierarchical clustering to automaticallyidentify defective and defect-free blocks. Effectiveness of the proposed methodis demonstrated through experiments on defective real-fabric images of 2 majorwallpaper groups (pmm and p4m groups).
机译:卡方直方图距离是可以用来发现两个直方图之间差异的距离度量之一。基于人类视觉系统的纹理识别是基于二阶统计量的事实,我们利用基于二阶统计量的灰度共生矩阵直方图(GLCM)并提出了一种新的自动缺陷机器视觉算法图案纹理检测。将输入缺陷图像分成几个周期性块,并在将灰度级从0-255量化为0-63之后计算GLCM,以保持GLCM的大小紧凑并减少计算时间。从GLCM的卡方距离得出的相异矩阵经过分层聚类,以自动识别有缺陷和无缺陷的块。通过对2个主要墙纸组(pmm和p4m组)的有缺陷的真实图像进行实验,证明了该方法的有效性。

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